Dry Based Chemical Absorption III-V Gas Abatement System (x Two)
This is a contract result notice, not an open opportunity. Details from the official award data.
This sits in the upper-middle of the Electrical Machinery & Apparatus band — a substantial contract for the sector. Based on 5,617 valued Electrical Machinery & Apparatus tenders in our corpus.
The EPSRC National Epitaxy Facility (NEF) at the University of Sheffield supplies a wide range of III-V semiconductor materials primarily to the UK academic research community by the means of the MOVPE (MOCVD) process.
The NEF also engages in significant activity researching and developing new materials and structures.
The NEF requires two new dry-chemical absorption-based gas abatement systems for scrubbing process gases carried by hydrogen to the abatement system by a system pump.
The system must be able to remove all hazardous materials efficiently and safely from the process tool ensuring the safety of personnel and in compliance with regulatory emission standards at the output of the abatement system.
What the supplier must deliver
The system must be able to remove
The system must be able to remove all hazardous materials efficiently and safely from the process tool ensuring the safety of personnel and in compliance with regulatory emission standards at the output of the abatement system.
Derived from the notice text — always confirm against the original documents.
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- OCID
- 9ef949be-f8a3-46b3-bdef-20a449a55bdc
- Stage
- contract · Contract
- Source
- Contracts Finder
- Buyer ref
- 2736/DM
Contains public sector information licensed under the Open Government Licence v3.0. Source data © Crown copyright.
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