202122/547 Supply of up to four dry etch and deposition systems
This is a contract result notice, not an open opportunity. Details from the official award data.
The procurement contact named on the official notice.
NOTICE OF AWARD OF four dry etch and deposition systems, specifically: •A Deep-Silicon Reactive Ion Etcher (D-RIE) •An Inductively Coupled Plasma-RIE (ICP-RIE) •A parallel plate RIE •A High-Density Plasma-enhanced Chemical Vapour Deposition system (HDP-CVD)
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- OCID
- ocds-h6vhtk-031776
- Stage
- award · Awarded
- Source
- Find a Tender
- Buyer ref
- 024931-2023
Contains public sector information licensed under the Open Government Licence v3.0. Source data © Crown copyright.
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